In situ magnetic a.nd structural analysis of epitaxial NisoFezo thin films for spin-valve heterostructures
نویسندگان
چکیده
We have investigated structural and magnetic properties of epitaxial (100) N&Feel0 films grown on relaxed Cu/Si(lOO) seed layers. The crystallographic texture and orientation of these films was analyzed in situ by reflection high energy electron diffraction (RHEED), and M situ by x-ray diffraction and cross-sectional transmission electron microscopy (XTEM). In particular, RHEED intensities were recorded during epitaxial growth, and intensity profiles across Bragg rods were used to calculate the surface lattice constant, and hence the film strain. XTEM analysis indicated that the epitaxial films had atomically abrupt interfaces The magnetic properties of these epitaxial films were measured in situ using magneto-optic Kerr effect magnetometry. Large N, (10-20 Oej was observed for epitaxial Nis,,Fez,, (100) films less than 10.0 nm thick whereas for larger thicknesses, W, decreased to a few Oe with the appearance of a uniaxial anisotropy. Correlations were made between magnetic properties of these epitaxial films and the strain in the film.
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